Virtual Cathode Deposition
Thin Film manufacturing technique
Plasma App ltd
new VCD tool prototype
a new patented technology to make a thin film coating of any material
Depositron Solo parameters
Benefits of VCD
Deposition temperature <60ᵒC due to short pulse duration
High deposition rate due to high pulse energy/repetition rate
High quality of film (same as PLD’s or better)
Industrialisation (Simplicity, reliability & scalability)
Virtual Plasma Cathode – originates from a plasma that temporarily appears in front of the target, generates an e-beam and then disappears for each pulse. So it:
Virtual Plasma Cathode
Founder and CEO
Dmitry Yarmolich holds PhD in physics from Israeli Institute of Technology.
More than 15 years hands-on experience in plasma applications and theoretical research of plasma is accomplished by more than 20 scientific publications and 2 patents applications.
Investor and Advisor
Denis Yarmolich holds MSc in applied math and physics from Moscow Institute of Physics and Technology followed by post-graduating in Institute of Numerical Mathematics Russian Academy of Science.
He has a great experience in emerging markets trading which he gained working as a director at Barclays Capital.
Phil Taylor is responsible for identifying new partners and applications for VCD technology.
Phil also has experience of raising VC funding for start-ups, and has advised companies on investor-readiness and project management.
He holds a PhD in high temperature diamond processing from University College London and a BSc in Biochemistry from Imperial College London, and has 10 years experience in diamond related R&D.
He holds several patents in diamond annealing and growth and has hands-on experience of IP management.
Products & Services
Tailor-made deposition process
For industrial scale
Of all types of materials
(conductor, dielectric, semiconductor)
On different substrates